26 May 1998 Ablation dynamic studies of polymers with a coherent VUV source at 125 nm
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Proceedings Volume 3404, ALT'97 International Conference on Laser Surface Processing; (1998) https://doi.org/10.1117/12.308622
Event: ALT '97 International Conference on Laser Surface Processing, 1997, Limoges, France
Abstract
First demonstration is given here about the use of a VUV coherent source at 125 nm for efficient and clean etching of polytetrafluoroethylene PTFE and poly(methyl methacrylate) PMMA polymers. Measurements of etch rate as a function of fluence and number of shots are presented and compared with previous works using 157 nm (F2 laser) and 193 nm (ArF laser). Experimental results are presented and physical approach is made with classical Beer-Lambert's absorption law and discussed.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
D. Riedel, D. Riedel, M. C. Castex, M. C. Castex, } "Ablation dynamic studies of polymers with a coherent VUV source at 125 nm", Proc. SPIE 3404, ALT'97 International Conference on Laser Surface Processing, (26 May 1998); doi: 10.1117/12.308622; https://doi.org/10.1117/12.308622
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