Laser machining of specially designed photopolymers: photochemical ablation mechanism

Thomas K. Lippert; J. Thomas Dickinson; Steve C. Langford; H. Furutani; H. Fukumura; Hiroshi M. Masuhara; Thilo Kunz; Alexander J. Wokaun

doi:10.1117/12.308615

26 May 1998 Laser machining of specially designed photopolymers: photochemical ablation mechanism

Thomas K. Lippert, J. Thomas Dickinson, Steve C. Langford, H. Furutani, H. Fukumura, Hiroshi M. Masuhara, Thilo Kunz, Alexander J. Wokaun

Author Affiliations +

Proceedings Volume 3404, ALT'97 International Conference on Laser Surface Processing; (1998) https://doi.org/10.1117/12.308615
Event: ALT '97 International Conference on Laser Surface Processing, 1997, Limoges, France

Abstract

Photopolymers based on the triazeno chromophore group (-NequalsN-N<) have been developed. The absorption properties can be tailored for a specific irradiation wavelength (e.g. 308 cm XeCl laser). The photochemical exothermic decomposition yields high energetic gaseous products which are not contaminating the surface. The polymer can be structured with high resolution. No debris has been found around the etched corners. Maximum ablation rates of about 3 micrometers / pulse were achieved due to the dynamic absorption behavior (bleaching during the pulse). No physical or chemical modifications of the polymer surface could be detected after irradiation at the tailored absorption wavelength, whereas irradiation at different wavelengths resulted in modified (physical and chemical) surfaces. The etching of the polymer starts and ends with the laser pulse, shown by ns-interferometry, confirming that the acting mechanism is mainly photochemical. TOF-MS revealed fragments which are also totally compatible with a photochemical decomposition mechanism.

Citation Download Citation

Thomas K. Lippert, J. Thomas Dickinson, Steve C. Langford, H. Furutani, H. Fukumura, Hiroshi M. Masuhara, Thilo Kunz, and Alexander J. Wokaun "Laser machining of specially designed photopolymers: photochemical ablation mechanism", Proc. SPIE 3404, ALT'97 International Conference on Laser Surface Processing, (26 May 1998); https://doi.org/10.1117/12.308615

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available