26 May 1998 Tin oxide pattern deposition by laser direct writing
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Proceedings Volume 3404, ALT'97 International Conference on Laser Surface Processing; (1998) https://doi.org/10.1117/12.308612
Event: ALT '97 International Conference on Laser Surface Processing, 1997, Limoges, France
Abstract
Tin oxide pattern generation by laser deposition from SnCl4(DOT)5H2O in isopropanol is reported. Smooth, even stripes of thicknesses ranging from 20 to 120 nm with sharp, well defined edges and cross-section are deposited by scanning an Ar+ laser beam ((lambda) equals 514.5 nm) focused onto the substrate--solution interface with a constant speed of 1 mm/s. The linewidth linearly increases from 26 to 42 micrometers with increasing the power from 40 to 120 mW. The reproducibility of pattern generation is extremely good as revealed by scanning electron microscopy, energy dispersive X-ray and micro-area Rutherford backscattering analyses. The minimum DC resistivity of 1.7(DOT)10-2 (Omega) cm, measured without any process optimization, favorably compares with those reported for films prepared by other techniques. The chemical composition of the film material in SnOx with 1.1 < x < 1.5 as determined by X-ray photoelectron spectroscopy.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tamas Szoerenyi, Tamas Szoerenyi, Zsolt Geretovszky, Zsolt Geretovszky, L. Kelemen, L. Kelemen, Jazsef Toth, Jazsef Toth, Alen Simon, Alen Simon, } "Tin oxide pattern deposition by laser direct writing", Proc. SPIE 3404, ALT'97 International Conference on Laser Surface Processing, (26 May 1998); doi: 10.1117/12.308612; https://doi.org/10.1117/12.308612
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