2 July 1998 X-ray micromachining with a laser-plasma source at 1-nm wavelength
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Proceedings Volume 3405, ROMOPTO '97: Fifth Conference on Optics; (1998) https://doi.org/10.1117/12.312747
Event: ROMOPTO '97: Fifth Conference on Optics, 1997, Bucharest, Romania
Abstract
A picosecond excimer laser-plasma source has been constructed which generates an x-ray average power of 2.2 Watt and 1.4 Watt at the wavelengths required for proximity x-ray lithography: 1.4 nm (steel target) and 1 nm (copper target), respectively. The plasma source could be scaled to the 50 - 75 W x-ray average power required for industrial lithographic production by scaling the total average power of the commercial excimer laser system up to 1 kW. The 1 nm x-ray source is used to micromachine a 2.5 THz microwave waveguide-cavity package with a 48 micrometers deep, 3D structure, using the LIGA technique.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
I. C. Edmond Turcu, I. C. Edmond Turcu, Chris M. Mann, Chris M. Mann, Sung W. Moon, Sung W. Moon, B. J. Maddison, B. J. Maddison, Ric M. Allott, Ric M. Allott, Nicola Lisi, Nicola Lisi, Syed Ejazu Huq, Syed Ejazu Huq, Nam Seong Kim, Nam Seong Kim, } "X-ray micromachining with a laser-plasma source at 1-nm wavelength", Proc. SPIE 3405, ROMOPTO '97: Fifth Conference on Optics, (2 July 1998); doi: 10.1117/12.312747; https://doi.org/10.1117/12.312747
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