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Chemical-amplification positive-resist design for 0.18-μm reticle fabrication using the 50-kV HL-800M electron-beam system
Automatic alternative phase-shift mask CAD layout tool for gate shrinkage of embedded DRAM in logic below 0.18 μm
Preliminary evaluation results of 895i and iP1700 replacement resist for advanced laser reticle fabrication
Gray map reference pattern generator of a die-to-database mask inspection system for 256-Mb and 1-Gb DRAMs
Current focused-ion-beam repair strategies for opaque defects and clear defects on advanced phase-shifting masks