1 September 1998 Detection of CD error caused by multipass writing method
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Proceedings Volume 3412, Photomask and X-Ray Mask Technology V; (1998) https://doi.org/10.1117/12.328831
Event: Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V, 1998, Kawasaki City, Japan
Abstract
As the IC design rule is getting smaller, mask writer's accuracy plays a more important role in mask making. In order to reduce writer's butting error, high end writers all use multi-pass writing technique. Theoretically, the more passes are used, the smaller butting error is expected. When writer with multi-pass technique has encountered abnormal sectors in the pattern loading system, extra or missing bits might cause CD variation on the paste. We found high end masks with CD variation smaller than 0.15 micrometers written by an eight pass writing system. It is very important to be able to detect this kind of CD error before the mask is shipped. In this paper, we will discuss TMC's approach to the detection of CD error caused by the writer.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andrew Wang, Andrew Wang, } "Detection of CD error caused by multipass writing method", Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); doi: 10.1117/12.328831; https://doi.org/10.1117/12.328831
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