1 September 1998 Development of a fast beam-blanking system
Author Affiliations +
Proceedings Volume 3412, Photomask and X-Ray Mask Technology V; (1998) https://doi.org/10.1117/12.328808
Event: Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V, 1998, Kawasaki City, Japan
In order to obtain a precise dose control for proximity effect correction, a fast beam blanking system has been developed which can make possible the fine control of the beam pulse width with precision of less than 1 nanosecond. The system consists of a high precision blanker driving circuit and a blanking structure suitable for fast operation. The blanker driving circuit controls the pulse width by selecting delay line logic with required delay. The pulse width control of less than 1 nanosecond and pulse rising time of less than 10 nanoseconds were achieved. A coaxial structure was adopted for the blanking structure. The simulation study has shown that a blanking structure with low reflectance in a few GHz range is achievable. The pulse passed through an experimental blanking structure without distortion in waveform.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Munehiro Ogasawara, Munehiro Ogasawara, Hitoshi Sunaoshi, Hitoshi Sunaoshi, Ryoji Yoshikawa, Ryoji Yoshikawa, } "Development of a fast beam-blanking system", Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); doi: 10.1117/12.328808; https://doi.org/10.1117/12.328808

Back to Top