1 September 1998 Gray map reference pattern generator of a die-to-database mask inspection system for 256-Mb and 1-Gb DRAMs
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Proceedings Volume 3412, Photomask and X-Ray Mask Technology V; (1998) https://doi.org/10.1117/12.328834
Event: Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V, 1998, Kawasaki City, Japan
Abstract
This paper describes a reference data generation method applied to a newly developed photolithographic mask inspection system, the MC-2000, for 256 Mbit and 1 Gbit DRAMs. The MC-2000, which utilizes i-line wavelength optics, is designed to have a defect detection capability as fine as 0.2 micrometers . A new reference data generation method employing a gray map pattern is effective for system performance in terms of accuracy of the map pattern and speed of the map data handling. Notable features of the gray map pattern generation method are simple algorithm and ease of hardware implementation. Corner pattern rounding circuit, re-sizing circuit, and reference data calculation have been developed together and are described, too. The proposed method was evaluated and an example of the detection of 0.2 micrometers defect is reported.
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Hideo Tsuchiya, Hideo Tsuchiya, Ikunao Isomura, Ikunao Isomura, Tomohide Watanabe, Tomohide Watanabe, Kyoji Yamashita, Kyoji Yamashita, } "Gray map reference pattern generator of a die-to-database mask inspection system for 256-Mb and 1-Gb DRAMs", Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); doi: 10.1117/12.328834; https://doi.org/10.1117/12.328834
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