1 September 1998 Modified particle detection method for reticle/mask particle detection system
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Proceedings Volume 3412, Photomask and X-Ray Mask Technology V; (1998) https://doi.org/10.1117/12.328840
Event: Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V, 1998, Kawasaki City, Japan
Abstract
A false detect in light scattering particle detection system is mainly caused by scattering light from densely designed pattern. HORIBA has developed a new signal processing method for particle detection systems in order to reduce false detect. This method reduce the scattering light signals form densely designed pattern in particular. This paper describes the method and the test result.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yoshinori Nagai, Yoshinori Nagai, Toyoki Kanzaki, Toyoki Kanzaki, } "Modified particle detection method for reticle/mask particle detection system", Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); doi: 10.1117/12.328840; https://doi.org/10.1117/12.328840
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