Translator Disclaimer
1 September 1998 New flatness measurement instrument for 230-mm lapped and polished photomasks
Author Affiliations +
Proceedings Volume 3412, Photomask and X-Ray Mask Technology V; (1998)
Event: Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V, 1998, Kawasaki City, Japan
Tropel has developed a new instrument for the measurement of next generation photomasks. The instrument is capable of measuring the flatness of rough lapped, fine lapped and polished mask blanks with better than 0.1 micrometer accuracy. Well suited to production control and process development, the instrument utilizes a non-contact method to perform complete surface evaluation in less than 1 minute. The fundamental measurement technique is grazing-incidence interferometry. A novel optical design suppresses interference fringes from unwanted second surface reflections. This is a significant advantage over normal- incidence interferometers that typically require photomasks to be temporarily coated to address second surface interference effects. Coating and subsequent cleaning may damage polished photomasks as well as add unnecessary process steps.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Paul G. Dewa, Andrew W. Kulawiec, Stephen K. Mack, and John J. Nemechek "New flatness measurement instrument for 230-mm lapped and polished photomasks", Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998);


Flatness nanometrology of large optically rough areas
Proceedings of SPIE (October 21 2004)
ASPHERO5 - rapid fabrication of precise aspheres
Proceedings of SPIE (October 19 2005)
A New Optical Surface Microprofiling Instrument
Proceedings of SPIE (November 15 1983)
Polishing robot based on FJP with in situ monitoring system
Proceedings of SPIE (December 22 2003)
Polished homogeneity testing of Corning fused silica boules
Proceedings of SPIE (November 11 1999)
Precision optics for long baseline interferometry
Proceedings of SPIE (July 19 1999)

Back to Top