1 September 1998 Pellicle-induced distortions on photomasks
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Proceedings Volume 3412, Photomask and X-Ray Mask Technology V; (1998) https://doi.org/10.1117/12.328829
Event: Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V, 1998, Kawasaki City, Japan
Abstract
We have investigated the pellicle induced distortions on mask of different sizes. The pattern placement on the masks was measured prior to the pelliclization and after pelliclization. The performance of the automatic pelliclization process was compared to the distortions induced by manual pellicle mounting. All investigations were performed using the LEICA LMS IPRO at Leica's demo center in Wetzlar and at Siemens Mask Shop in Munich. The LMS IPRO was equipped with the new long working distance lens having a free working distance of 8mm.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Klaus-Dieter Roeth, Klaus-Dieter Roeth, Thomas Struck, Thomas Struck, } "Pellicle-induced distortions on photomasks", Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); doi: 10.1117/12.328829; https://doi.org/10.1117/12.328829
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