Process optimization for mask fabrication

Hideaki Sakurai; Masamitsu Itoh; Akitoshi Kumagae; Hirohito Anze; Takayuki Abe; Iwao Higashikawa

doi:10.1117/12.328799

1 September 1998 Process optimization for mask fabrication

Hideaki Sakurai, Masamitsu Itoh, Akitoshi Kumagae, Hirohito Anze, Takayuki Abe, Iwao Higashikawa

Proceedings Volume 3412, Photomask and X-Ray Mask Technology V; (1998) https://doi.org/10.1117/12.328799
Event: Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V, 1998, Kawasaki City, Japan

Abstract

Recently, next-generation mask fabrication processes have been actively examined for application with Electron Beam writing tools and chemically amplified resists. In this study, we used a variable shaped electron beam writing system with an accelerating voltage and chemically amplified resist to investigate the dependence of the CD error in a localized area of a 6025 mask on the process factors, with the goal of fabricating more accurate masks with improving sensitivity. Our results indicated that CD error in a localized area did not depend on the resist thickness. Higher sensitivity and CD uniformity were achieved simultaneously. Moreover, we could isolate the CD error caused by the resist heating effect is more apparent for higher doses than lower doses. However, a higher dose gives rise to a small CD change rate. In this experiment, the effect of the lower CD change rate at a higher dose counterbalances the resist heating effect. By decreasing CD error in a localized area, we obtained a CD uniformity of 14 nm in a 100 mm area on the mask.

Citation Download Citation

Hideaki Sakurai, Masamitsu Itoh, Akitoshi Kumagae, Hirohito Anze, Takayuki Abe, and Iwao Higashikawa "Process optimization for mask fabrication", Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); https://doi.org/10.1117/12.328799

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available