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1 September 1998 Reticle defects on optical proximity correction features
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Proceedings Volume 3412, Photomask and X-Ray Mask Technology V; (1998) https://doi.org/10.1117/12.328858
Event: Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V, 1998, Kawasaki City, Japan
Abstract
A test mask has been developed and used to characterize automatic defect inspection systems. Characterization was performed on three generations of inspections algorithm and revealed an increase in the detection rate of defects on serifs and jogs with each succeeding algorithm and equipment generation.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Larry S. Zurbrick "Reticle defects on optical proximity correction features", Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); https://doi.org/10.1117/12.328858
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