1 September 1998 Use of line-width error detection for quality control in reticle fabrication
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Proceedings Volume 3412, Photomask and X-Ray Mask Technology V; (1998) https://doi.org/10.1117/12.328835
Event: Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V, 1998, Kawasaki City, Japan
Abstract
As design rules in high-end photo-lithographic reticles become tighter, the monitoring of line-width variations becomes more vital in the quality control of advance reticle manufacturing processes. In this paper a new concept of operation is presented, for using an inspection tool in the monitoring of line-width variants for the purpose improving such quality control. The inspection tool use in this paper, is Orbot-Applied's RT8000ES Reticle Inspection tool, in which the newly developed Line Width Error Detector is embedded.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yair Eran, Yair Eran, Gidon Gottlib, Gidon Gottlib, Gad Greenberg, Gad Greenberg, Jeremy Zelenko, Jeremy Zelenko, "Use of line-width error detection for quality control in reticle fabrication", Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); doi: 10.1117/12.328835; https://doi.org/10.1117/12.328835
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