1 September 1998 Use of line-width error detection for quality control in reticle fabrication
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Proceedings Volume 3412, Photomask and X-Ray Mask Technology V; (1998) https://doi.org/10.1117/12.328835
Event: Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V, 1998, Kawasaki City, Japan
Abstract
As design rules in high-end photo-lithographic reticles become tighter, the monitoring of line-width variations becomes more vital in the quality control of advance reticle manufacturing processes. In this paper a new concept of operation is presented, for using an inspection tool in the monitoring of line-width variants for the purpose improving such quality control. The inspection tool use in this paper, is Orbot-Applied's RT8000ES Reticle Inspection tool, in which the newly developed Line Width Error Detector is embedded.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yair Eran, Yair Eran, Gidon Gottlib, Gidon Gottlib, Gad Greenberg, Gad Greenberg, Jeremy Zelenko, Jeremy Zelenko, } "Use of line-width error detection for quality control in reticle fabrication", Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); doi: 10.1117/12.328835; https://doi.org/10.1117/12.328835
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