High-temperature operation of 650-nm AlGaInP quantum well laser diodes grown by LP-MOCVD

Xiaoyu Ma; Qing Cao; Guohong Wang; Liang Guo; Peng Lian; Liming Wang; Xiaoyan Zhang; Yali Yang; Hongqin Zhang; Lianhui Chen

doi:10.1117/12.311001

22 June 1998 High-temperature operation of 650-nm AlGaInP quantum well laser diodes grown by LP-MOCVD

Xiaoyu Ma, Qing Cao, Guohong Wang, Liang Guo, Peng Lian, Liming Wang, Xiaoyan Zhang, Yali Yang, Hongqin Zhang, Lianhui Chen

Author Affiliations +

Proceedings Volume 3419, Optoelectronic Materials and Devices; 34190I (1998) https://doi.org/10.1117/12.311001
Event: Asia Pacific Symposium on Optoelectronics '98, 1998, Taipei, Taiwan

Abstract

Low threshold current and high temperature operation of 650nm AlGaInP quantum well laser diodes grown by low pressure metal organic chemical vapor deposition are reported in this paper. 650nm laser diodes with threshold current as low as 22-24mA at room temperature, and the operating temperature over 90 degrees C at CW output power 5 mW were achieved in this study. These lasers are stable during 72 hours burn in under 5mW at 90 degrees C.

Citation Download Citation

Xiaoyu Ma, Qing Cao, Guohong Wang, Liang Guo, Peng Lian, Liming Wang, Xiaoyan Zhang, Yali Yang, Hongqin Zhang, and Lianhui Chen "High-temperature operation of 650-nm AlGaInP quantum well laser diodes grown by LP-MOCVD", Proc. SPIE 3419, Optoelectronic Materials and Devices, 34190I (22 June 1998); https://doi.org/10.1117/12.311001

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