Improving Registration In Photolithography

H. R. Rottmann

doi:10.1117/12.933679

15 October 1982 Improving Registration In Photolithography

H. R. Rottmann

Proceedings Volume 0342, Integrated Circuit Metrology I; (1982) https://doi.org/10.1117/12.933679
Event: 1982 Technical Symposium East, 1982, Arlington, United States

Abstract

During the next five to ten years we can expect optical lithography to reach its limits, which may be defined as the printability of minimum feature sizes ranging from about 0.4 μm to 0.8 μm.

Citation Download Citation

H. R. Rottmann "Improving Registration In Photolithography", Proc. SPIE 0342, Integrated Circuit Metrology I, (15 October 1982); https://doi.org/10.1117/12.933679

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