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14 July 1998 Cathode roughness effects in a high-PRF long-pulse XeCl laser
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Proceedings Volume 3423, Second GR-I International Conference on New Laser Technologies and Applications; (1998) https://doi.org/10.1117/12.316556
Event: Second GR-I International Conference on New Laser Technologies and Applications, 1997, Olympia, Greece
Abstract
The uniformity and stability of discharge process in a high pulse repetition frequency long pulse XeCl laser are investigated for three different copper electrode roughnesses in single shot regime and versus PRF. The discharge quality evolution is experimentally analyzed from discharge photographs obtained with CCD video camera and pressure perturbation measurements achieved with a piezoelectric pressure probe placed very close to the discharge volume.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
I. Tassy, Philippe Ch. Delaporte, Bernard L. Fontaine, Bernard M. Forestier, Marc L. Sentis, and Olivier P. Uteza "Cathode roughness effects in a high-PRF long-pulse XeCl laser", Proc. SPIE 3423, Second GR-I International Conference on New Laser Technologies and Applications, (14 July 1998); https://doi.org/10.1117/12.316556
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