14 July 1998 Electron beam lithography on LiF films for integrated active optical waveguides
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Proceedings Volume 3423, Second GR-I International Conference on New Laser Technologies and Applications; (1998) https://doi.org/10.1117/12.316557
Event: Second GR-I International Conference on New Laser Technologies and Applications, 1997, Olympia, Greece
Abstract
Low energy electron beam irradiation of LiF single crystals and polycrystalline films induces efficient formation of stable laser active defects emitting in the visible spectral range at room temperature, together with a consistent increase of the real part of the refractive index in the same wavelength interval. The use of electron lithography techniques look promising for the realization of active channel waveguides.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Giuseppe Baldacchini, Giuseppe Baldacchini, E. Burattini, E. Burattini, Antonio Grilli, Antonio Grilli, A. Raco, A. Raco, Antonella Mancini, Antonella Mancini, Rosa Maria Montereali, Rosa Maria Montereali, A. Pace, A. Pace, } "Electron beam lithography on LiF films for integrated active optical waveguides", Proc. SPIE 3423, Second GR-I International Conference on New Laser Technologies and Applications, (14 July 1998); doi: 10.1117/12.316557; https://doi.org/10.1117/12.316557
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