Paper
14 July 1998 Laser-induced deposition and etching of tungsten microstructures
K. Piglmayer, H. Schieche, R. Chabicovsky
Author Affiliations +
Proceedings Volume 3423, Second GR-I International Conference on New Laser Technologies and Applications; (1998) https://doi.org/10.1117/12.316606
Event: Second GR-I International Conference on New Laser Technologies and Applications, 1997, Olympia, Greece
Abstract
Micron-sized deposition and etching of W in WF6 + H2 atmosphere is investigated by local laser-induced heating of thin tungsten layers on quartz substrates. The process is strongly dependent on the partial pressures of the two gases. A process with high amount of hydrogen permits deposition of W, whereas etching of W occurs if the working gas does not contain hydrogen.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
K. Piglmayer, H. Schieche, and R. Chabicovsky "Laser-induced deposition and etching of tungsten microstructures", Proc. SPIE 3423, Second GR-I International Conference on New Laser Technologies and Applications, (14 July 1998); https://doi.org/10.1117/12.316606
Lens.org Logo
CITATIONS
Cited by 2 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Etching

Tungsten

Scanning electron microscopy

Hydrogen

Quartz

Gases

Argon

Back to Top