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27 October 1998 Testing of optical materials for 193-nm applications
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Abstract
We present an assessment of bulk fused silica and calcium fluoride, and of antireflective coatings for 193-nm lithographic applications. In the course of extensive marathon studies we have accumulated 1-5 billion laser pulses on over 100 bulk material samples at fluences from 0.2 to 4 mJ/cm2/pulse. The result show large variation in both initial and induced absorption of fused silica and in densification of fused silica. For antireflective coatings, there are samples that undergo no appreciable degradation when irradiated for > 1 billion pulses at 15 mJ/cm2/pulse. However, initial losses in some coatings may be unacceptably high for lithographic applications.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Vladimir Liberman, Mordechai Rothschild, Jan H. C. Sedlacek, Ray S. Uttaro, Andrew Grenville, Allen Keith Bates, and Chris K. Van Peski "Testing of optical materials for 193-nm applications", Proc. SPIE 3427, Optical Systems Contamination and Degradation, (27 October 1998); https://doi.org/10.1117/12.328512
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