26 October 1998 Improving the radiometric performance of silicon-micromachined thermal infrared sources
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The emitting area of the infrared sources comprising silicon micromachined thermal pixel arrays is often notably smaller than the actual pixel area. This results in the infrared sources being operated at higher temperatures than apparent temperatures which therefore limits radiometric dynamic range. An optomechanical means has been developed that transforms the low-fill factor devices into having a much higher fill factor. The theory, fabrication, and initial tests results are presented.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. Barry Johnson, "Improving the radiometric performance of silicon-micromachined thermal infrared sources", Proc. SPIE 3436, Infrared Technology and Applications XXIV, (26 October 1998); doi: 10.1117/12.328076; https://doi.org/10.1117/12.328076


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