16 October 1998 Tunable 1.3- to 5-μm wavelength target reflectance measurement system
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We describe a tunable, 1.3 to 5 micrometers wavelength reflectance measurement system using an optical parametric oscillator (OPO) as the light source. The OPO source consists of a 1 micrometers Nd:YAG laser which is frequently shifted to 1.3-5 micrometers wavelengths using a periodically poled lithium niobate nonlinear optical crystal. The system design, calibration, and measurement of the directional-hemispherical reflectance factor and the bi-directional reflectance distribution function of different target materials are presented.
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Mohan Vaidyanathan, Mohan Vaidyanathan, William F. Lynn, William F. Lynn, Wendy C. Shemano, Wendy C. Shemano, Carl W. Schmidt, Carl W. Schmidt, Paul F. McManamon, Paul F. McManamon, "Tunable 1.3- to 5-μm wavelength target reflectance measurement system", Proc. SPIE 3438, Imaging Spectrometry IV, (16 October 1998); doi: 10.1117/12.328108; https://doi.org/10.1117/12.328108

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