19 November 1998 Characterization of Mo/B4C soft x-ray multilayer mirrors for 7.3- to 8.0-nm radiation
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Mo/B4C is chosen for the materials of the multilayer mirrors for 7.3nm and 8.0nm. The structural parameter has been designed and the mirrors has been fabricated by magnetron sputtering. Details in the microstructure of Mo/B4C multilayer were revealed using x-ray diffraction and TEM. The period thickness of each mirrors can be determined from the curve of x-ray diffraction, and they are 3.74nm and 4.12nm, respectively, which are in good agreement with the design parameters.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Junxia Lu, Junxia Lu, Yueying Ma, Yueying Ma, Shu Pei, Shu Pei, Jianlin Cao, Jianlin Cao, Xingdan Chen, Xingdan Chen, } "Characterization of Mo/B4C soft x-ray multilayer mirrors for 7.3- to 8.0-nm radiation", Proc. SPIE 3444, X-Ray Optics, Instruments, and Missions, (19 November 1998); doi: 10.1117/12.331287; https://doi.org/10.1117/12.331287


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