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6 November 1998 Experimental and theoretical performances of an implanted lamellar multilayer grating
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This paper reports on recent developments on lamellar multilayer gratings fabricated by ions implantation. Comparative investigations between conventional etched multilayer grating and implanted ones are made and outline the potentialities of the original process of fabrication. In addition, simulations were carried for different types of Cu K(alpha) 1 x-ray measurements by using a rigorous theory of diffraction recently revised. The quality of the fits obtained with this method easily applicable to the implanted multilayer grating appears as an essential tool in the improvement of x-ray diffractive optics fabrication processes.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hughes Trambly, Frederic Montiel, Michel Neviere, and Bernard Vidal "Experimental and theoretical performances of an implanted lamellar multilayer grating", Proc. SPIE 3449, X-Ray Microfocusing: Applications and Techniques, (6 November 1998);

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