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15 September 1982 Laser Chemical Vapor Deposition Using Cw And Pulsed Lasers
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Proceedings Volume 0346, Thin Film Technologies and Special Applications; (1982) https://doi.org/10.1117/12.933787
Event: 1982 Technical Symposium East, 1982, Arlington, United States
Abstract
Laser chemical vapor deposition (LCVD) uses a focused laser beam to locally heat the substrate and drive the CVD reaction. LCVD, therefore, shares the advantages of other laser processing techniques including spatial resolution and control and rapid heating and cooling rates. Characteristics of several types of LCVD films and experiments in optical monitoring of LCVD rates using both pulsed and cw laser are presented.
© (1982) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Susan D. Allen "Laser Chemical Vapor Deposition Using Cw And Pulsed Lasers", Proc. SPIE 0346, Thin Film Technologies and Special Applications, (15 September 1982); https://doi.org/10.1117/12.933787
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