13 October 1998 Near-field optical readout for phase-changed marks
Author Affiliations +
Abstract
We have observed near-field optical images of phase change marks and evaluated the readout signals including the optical near-field. Samples were composed of multilayered structures on glass substrates. Crystalline marks were recorded by a focused laser beam with an optical microscope in the as-deposited amorphous films. In readout, the optical and the topographical images of the recorded marks were evaluated at the same time by a collection mode near-field scanning optical microscope (NSOM). The surface profiles showed less than 1 nm dips around the marks. Therefore it means that the NSOM image of phase change marks depends on the refractive index change. The evaluated signal modulation of the optical image showed a sinusoidal curve to the top SiN layer thickness, and the maximum modulation was 60 percent.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Takashi Nakano, Takashi Nakano, Junji Tominaga, Junji Tominaga, Nobufumi Atoda, Nobufumi Atoda, } "Near-field optical readout for phase-changed marks", Proc. SPIE 3467, Far- and Near-Field Optics: Physics and Information Processing, (13 October 1998); doi: 10.1117/12.326828; https://doi.org/10.1117/12.326828
PROCEEDINGS
6 PAGES


SHARE
Back to Top