6 July 1998 Electron-radiation-sensitive hybrid sol-gel materials for electron-beam lithography and diffractive optics
Author Affiliations +
Abstract
We present two techniques to use hybrid sol-gel materials for electron-beam lithography and direct writing of surface relief diffractive elements. We are able to obtain direct physical electron beam etching of hybrid sol-gel glass and variable- doses can induce complex multi-phase-level diffractive elements and apodized sol-gel waveguide gratings. We are also able to obtain hybrid so-gel glass formation under the electron radiation, so that material can be used as a negative resist in electron-beam lithography. Both of these techniques are promising for the fabrication of submicron optical components and micromachining tools such as embossing masters for the replication.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Juha T. Rantala, Juha T. Rantala, R. Scott Penner, R. Scott Penner, Seppo Honkanen, Seppo Honkanen, Nina Nordman, Nina Nordman, Olli Nordman, Olli Nordman, Jouko Vaehaekangas, Jouko Vaehaekangas, Mahmoud Fallahi, Mahmoud Fallahi, Nasser Peyghambarian, Nasser Peyghambarian, } "Electron-radiation-sensitive hybrid sol-gel materials for electron-beam lithography and diffractive optics", Proc. SPIE 3469, Organic-Inorganic Hybrid Materials for Photonics, (6 July 1998); doi: 10.1117/12.312923; https://doi.org/10.1117/12.312923
PROCEEDINGS
8 PAGES


SHARE
Back to Top