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6 July 1998 Photolithography fabrication of sol-gel ridge waveguides
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Abstract
We report on fabrication of ridge waveguides in UV-light sensitive glass sol-gel thin films, deposited on silicon substrate, using a simple photolithography process. The single-layer films are prepared at low temperature and deep UV-light (DUV) is employed to make the waveguides. The effect of fabrication parameters on waveguide shape is investigated.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rahmani Sara, Tahar Touam, Chantal Blanchetiere, Z. Saddiki, Kalaichelvi Saravanamuttu, Xin M. Du, Jacek Chrostowski, Mark P. Andrews, and S. Iraj Najafi "Photolithography fabrication of sol-gel ridge waveguides", Proc. SPIE 3469, Organic-Inorganic Hybrid Materials for Photonics, (6 July 1998); doi: 10.1117/12.312911; https://doi.org/10.1117/12.312911
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