Flatness measurement by a UV moire technique

Hisatoshi Fujiwara; Yutaka Kodera; Yukitoshi Otani; Toru Yoshizawa

doi:10.1117/12.312970

30 June 1998 Flatness measurement by a UV moire technique

Hisatoshi Fujiwara, Yutaka Kodera, Yukitoshi Otani, Toru Yoshizawa

Proceedings Volume 3478, Laser Interferometry IX: Techniques and Analysis; (1998) https://doi.org/10.1117/12.312970
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1998, San Diego, CA, United States

Abstract

A moire method using phase shifting technique is proposed for a flatness measurement, with highly accurate and fast measurement time, especially of computer discs, wafers or glass substrates. Two methods are proposed for the expansion of measurement size and for the elimination of the reflected light from the back plane of the glass substrate. One is to joint small measured areas one another the flatness of which are measured in advance and the other is UV moire technique. Using these techniques, the proposed system realizes higher accuracy than conventional techniques without any limitation of the size in the glass substrate measurement.

Citation Download Citation

Hisatoshi Fujiwara, Yutaka Kodera, Yukitoshi Otani, and Toru Yoshizawa "Flatness measurement by a UV moire technique", Proc. SPIE 3478, Laser Interferometry IX: Techniques and Analysis, (30 June 1998); https://doi.org/10.1117/12.312970

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