Precise measurement of nonoptical surfaces by an oblique incidence interferometer

Yukitoshi Otani; Toyoaki Kuwahara; Masayuki Yamamoto; Toru Yoshizawa

doi:10.1117/12.312939

30 June 1998 Precise measurement of nonoptical surfaces by an oblique incidence interferometer

Yukitoshi Otani, Toyoaki Kuwahara, Masayuki Yamamoto, Toru Yoshizawa

Proceedings Volume 3478, Laser Interferometry IX: Techniques and Analysis; (1998) https://doi.org/10.1117/12.312939
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1998, San Diego, CA, United States

Abstract

Silicon wafers are widely used for semiconductors. Its flatness is very important in the inspection process. An oblique incidence interferometer with a one step phase- shifting technique using only one image was proposed for its inspection. This technique is developed for precise surface profile measurement even if the sample is mirror surface with multiple reflection between measurement and reference surface. To cover a large measurement area, the extension of the measurement area is archived to combine small area one after the another.

Citation Download Citation

Yukitoshi Otani, Toyoaki Kuwahara, Masayuki Yamamoto, and Toru Yoshizawa "Precise measurement of nonoptical surfaces by an oblique incidence interferometer", Proc. SPIE 3478, Laser Interferometry IX: Techniques and Analysis, (30 June 1998); https://doi.org/10.1117/12.312939

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