30 June 1998 Precise measurement of nonoptical surfaces by an oblique incidence interferometer
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Abstract
Silicon wafers are widely used for semiconductors. Its flatness is very important in the inspection process. An oblique incidence interferometer with a one step phase- shifting technique using only one image was proposed for its inspection. This technique is developed for precise surface profile measurement even if the sample is mirror surface with multiple reflection between measurement and reference surface. To cover a large measurement area, the extension of the measurement area is archived to combine small area one after the another.
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Yukitoshi Otani, Yukitoshi Otani, Toyoaki Kuwahara, Toyoaki Kuwahara, Masayuki Yamamoto, Masayuki Yamamoto, Toru Yoshizawa, Toru Yoshizawa, } "Precise measurement of nonoptical surfaces by an oblique incidence interferometer", Proc. SPIE 3478, Laser Interferometry IX: Techniques and Analysis, (30 June 1998); doi: 10.1117/12.312939; https://doi.org/10.1117/12.312939
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