9 December 1998 Niobium nitride/aluminum nitride superlattices
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Abstract
DC reactive magnetron sputtering has been used to prepare niobium nitride/aluminium nitride superconducting/insulator superlattices. Deposition conditions were optimized in order that multilayer fabrication could be achieved by simple computer control of the substrate positioning beneath each sputtering target.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zoe H. Barber, El Hadi S. Sadki, Richard A. Doyle, Stephen J. Lloyd, Mark G. Blamire, "Niobium nitride/aluminum nitride superlattices", Proc. SPIE 3480, Superconducting Superlattices II: Native and Artificial, (9 December 1998); doi: 10.1117/12.332445; https://doi.org/10.1117/12.332445
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