21 September 1998 Misalignment modes in off-axis lithography projection cameras
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Proceedings Volume 3482, International Optical Design Conference 1998; (1998) https://doi.org/10.1117/12.322071
Event: International Optical Design Conference, 1998, Kona, HI, United States
We discuss the calculation and effect of rigid-body- perturbation misalignment modes in two off-axis extreme- ultraviolet lithography projection cameras: a 4-mirror, 0.14-numerical-aperture (NA) design and a 6-mirror, NA equals 0.2 design. Two sets of modes are considered: (1) modes associated with camera distortion within the design ring field of view and (2) modes associated with camera exit- pupil wavefront 632.8-nm-light metrology data. We show that in the case of the 4-mirror design, a significant distortion misalignment mode coincides with a difficult-to-detect metrology misalignment mode.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael R. Descour, Curtis Earl Volin, Mark R. Willer, "Misalignment modes in off-axis lithography projection cameras", Proc. SPIE 3482, International Optical Design Conference 1998, (21 September 1998); doi: 10.1117/12.322071; https://doi.org/10.1117/12.322071

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