21 September 1998 New developments in the design of ring-field projection cameras for EUV lithography: passive pupil correction
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Proceedings Volume 3482, International Optical Design Conference 1998; (1998) https://doi.org/10.1117/12.322069
Event: International Optical Design Conference, 1998, Kona, HI, United States
Abstract
The design of all-reflective cameras for EUV-lithography is an area of lens design that has received attention in the last few years. One important goal is to design a projection camera that meets first-order requirements, image quality requirements, packaging requirements, minimizes the number of mirrors to minimize reflection losses, and that can be successfully manufactured. From the optical design point of view it is desirable to use the best designing tools and concepts to maximize the performance of a projection camera. The optical requirements are so stringent that every little bit of design help is welcome. Examples of some useful optical design ideas are the annular field concept and the concept of annular surfaces. In this paper we discuss how the concept of passive pupil correction can be applied to improve the theoretical performance of an annular or ring field system.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jose M. Sasian, Jose M. Sasian, } "New developments in the design of ring-field projection cameras for EUV lithography: passive pupil correction", Proc. SPIE 3482, International Optical Design Conference 1998, (21 September 1998); doi: 10.1117/12.322069; https://doi.org/10.1117/12.322069
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