Transmission polarizing beam-splitter grating for reconfigurable optical interconnects

Jerome Hazart; Philippe Lalanne; Pierre H. Chavel; Edmond Cambril; Huguette Launois

doi:10.1117/12.308875

22 May 1998 Transmission polarizing beam-splitter grating for reconfigurable optical interconnects

Jerome Hazart, Philippe Lalanne, Pierre H. Chavel, Edmond Cambril, Huguette Launois

Proceedings Volume 3490, Optics in Computing '98; (1998) https://doi.org/10.1117/12.308875
Event: Optics in Computing '98, 1998, Bruges, Belgium

Abstract

We present the design, fabrication, and test of a 90 degree(s) polarizing beam splitter grating for 633 nm. This component is compact and its fabrication is reproducible enough to be integrated in optical reconfigurable interconnect systems. For TE polarization, the incident beam is undeflected whereas TM beams exhibit a 90 degrees deviation. We used electromagnetic vector theory to optimize diffraction efficiencies and the extinction ratio. We employed direct electron beam writing and reactive ion etching to fabricate a polarizing beam splitter etched in a photoresist layer deposited on a fused silica substrate.

Citation Download Citation

Jerome Hazart, Philippe Lalanne, Pierre H. Chavel, Edmond Cambril, and Huguette Launois "Transmission polarizing beam-splitter grating for reconfigurable optical interconnects", Proc. SPIE 3490, Optics in Computing '98, (22 May 1998); https://doi.org/10.1117/12.308875

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