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27 August 1998 Noncontact COS charge analysis for in-line monitoring of wet cleaning processes
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Abstract
Contamination levels in chemical cleaning equipment and wafer cleanliness in general are very critical to semiconductor manufacturers. In this work, a Keithley Instruments non contact electrical tester (Quantox) is used to measure the mobile ion (Qm) contamination in a variety of cleaning processes. Results show that photoresist strip cleaning process has a higher mobile ion concentration than standard pre-diffusion cleaning process. RCA1, RCA2 and HF solutions mapping measured by the Quantox indicates some negative static charges on the surface after cleaning. This negative field appears to assist Qm removal during wet chemical cleaning. The dependence of flatband voltage and other oxide charges on various cleaning processes has also been investigated using the Quantox. The data suggests that a dipole layer has been formed by a surface reaction during chemical cleaning.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xiafang Zhang, Min Juang, Sung-Shan Tai, Kuo-in Chen, Ejigu Wossen, and Gregory Horner "Noncontact COS charge analysis for in-line monitoring of wet cleaning processes", Proc. SPIE 3509, In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing II, (27 August 1998); doi: 10.1117/12.324398; https://doi.org/10.1117/12.324398
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