31 August 1998 Fabrication of polycrystalline diamond film resonators
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Proceedings Volume 3511, Micromachining and Microfabrication Process Technology IV; (1998) https://doi.org/10.1117/12.324295
Event: Micromachining and Microfabrication, 1998, Santa Clara, CA, United States
In this paper, the fabrication process of polycrystalline diamond film micro-resonators was first reported. Silicon was used as substrate, LPCVD polysilicon films were used as diamond-growth-compatible sacrificial layer, and doped diamond films were grown and patterned by oxygen ion beam dry etching to be the resonators. The flexural beam resonator was vibrated in air under electrostatic excitation with AC voltage of 45 V.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xiaodong Wang, Xiaodong Wang, Yirong Yang, Yirong Yang, Jianfang Xie, Jianfang Xie, Weiyuan Wang, Weiyuan Wang, Zongxin Ren, Zongxin Ren, } "Fabrication of polycrystalline diamond film resonators", Proc. SPIE 3511, Micromachining and Microfabrication Process Technology IV, (31 August 1998); doi: 10.1117/12.324295; https://doi.org/10.1117/12.324295

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