Paper
31 August 1998 Optical properties of micromachined polysilicon reflective surfaces with etching holes
Jun Zou, Colin Byrne, Chang Liu, David J. Brady
Author Affiliations +
Proceedings Volume 3511, Micromachining and Microfabrication Process Technology IV; (1998) https://doi.org/10.1117/12.324315
Event: Micromachining and Microfabrication, 1998, Santa Clara, CA, United States
Abstract
MUMPS (Multi-User MEMS Process) is receiving increasingly wide use in micro optics. We have investigated the optical properties of the polysilicon reflective surface in a typical MUMPS chip within the visible light spectrum. The effect of etching holes on the reflected laser beam is studied. The reflectivity and diffraction patterns at five different wavelengths have been measured. The optical properties of the polysilicon reflective surface are greatly affected by the surface roughness, the etching holes, as well as the material. The etching holes contribute to diffraction and reduction of reflectivity. This study provides a basis for optimal design of micromachined free-space optical systems.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jun Zou, Colin Byrne, Chang Liu, and David J. Brady "Optical properties of micromachined polysilicon reflective surfaces with etching holes", Proc. SPIE 3511, Micromachining and Microfabrication Process Technology IV, (31 August 1998); https://doi.org/10.1117/12.324315
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Cited by 4 scholarly publications.
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KEYWORDS
Diffraction

Etching

Reflectivity

Reflection

Silicon

Optical properties

Surface roughness

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