2 September 1998 Extremely high aspect ratio metal structures for suspension of a micro-optical shutter
Author Affiliations +
Proceedings Volume 3513, Microelectronic Structures and MEMS for Optical Processing IV; (1998) https://doi.org/10.1117/12.324269
Event: Micromachining and Microfabrication, 1998, Santa Clara, CA, United States
Abstract
A bulk micromachining process for fabricating extremely high aspect ratio metal structures is developed. The structures are thin films perpendicular to the plane of the substrate. The metal structures offer various physical and chemical properties depending on the choice of the metal used. Internal stress considerations for the choice of metal are also discussed.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Allan P. Hui, Risaku Toda, Masayoshi Esashi, "Extremely high aspect ratio metal structures for suspension of a micro-optical shutter", Proc. SPIE 3513, Microelectronic Structures and MEMS for Optical Processing IV, (2 September 1998); doi: 10.1117/12.324269; https://doi.org/10.1117/12.324269
PROCEEDINGS
6 PAGES


SHARE
RELATED CONTENT

Thin film front protection of CMOS wafers against KOH
Proceedings of SPIE (September 08 1998)
Role of RIE in microchip bond pad corrosion
Proceedings of SPIE (September 12 1996)
High-aspect-ratio fine-line metallization
Proceedings of SPIE (August 31 1998)

Back to Top