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2 September 1998 Modeling and measurement of electrostatic micromirror array fabricated with single-layer polysilicon micromachining technology
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Proceedings Volume 3513, Microelectronic Structures and MEMS for Optical Processing IV; (1998) https://doi.org/10.1117/12.324283
Event: Micromachining and Microfabrication, 1998, Santa Clara, CA, United States
Abstract
A silicon based micro mirror array is a highly efficient component for use in optical applications as adaptive optical systems and optical correlators. Many types of micro mirror or micro mirror array have been studied and proposed in order to obtain the optimal performance according to their own purposes. A micro mirror array designed, fabricated and tested in this paper consists of 5 X 5 single layer polysilicon-based, electrostatically driven actuators. The micro mirror array for the optical phase modulation is made by using only two masks and can be driven independently by 25 channel circuits. About 6 (pi) phase modulation is obtained in He-Ne laser ((lambda) equals 633 nm) with 67% fill-factor. In this paper, the deflection characteristics of the actuators in controllable range were studied. The experimental results show that the deflection characteristics is much dependent upon a residual stress in flexure, the initial curvature of mirror due to stress gradient and an electrostatic force acted on other element except for mirror itself. The modeling results agree well with the experimental results. Also, it is important to fabricate a flat mirror that is not initially curved because the curved mirror brings a bad performance in optical use. Therefore, a new method to obtain the flat mirror by using the gold metallization in spite of the residual stress unbalance is proposed in this paper.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Young-Hoon Min and Yong-Kweon Kim "Modeling and measurement of electrostatic micromirror array fabricated with single-layer polysilicon micromachining technology", Proc. SPIE 3513, Microelectronic Structures and MEMS for Optical Processing IV, (2 September 1998); https://doi.org/10.1117/12.324283
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