Selective hydrophobic and hydrophilic texturing of surfaces using photolithographic photodeposition of polymers

Darren K. Jones; Carlos H. Mastrangelo; Mark A. Burns; David T. Burke

doi:10.1117/12.322075

10 September 1998 Selective hydrophobic and hydrophilic texturing of surfaces using photolithographic photodeposition of polymers

Darren K. Jones, Carlos H. Mastrangelo, Mark A. Burns, David T. Burke

Author Affiliations +

Proceedings Volume 3515, Microfluidic Devices and Systems; (1998) https://doi.org/10.1117/12.322075
Event: Micromachining and Microfabrication, 1998, Santa Clara, CA, United States

Abstract

The control and localization of small volumes of aqueous solutions inside miniature reactors is a topic of growing significance. A simple control method relies on patterning regions of different wetability that define and guide the liquid spread within these systems. In this paper photolithographic photodeposition is demonstrated as a technique for texturing patterned surfaces. Hydrophobic surfaces are created by selectively photopolymerizing trifluorochloroethylene gas (C₂F₃Cl) through a quartz mask. Similarly, hydrophilic surfaces are created via acetylene (C₂H₂) photopolymerization. These surfaces are demonstrated to provide a simple and effective means of fluidic control and localization.

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Darren K. Jones, Carlos H. Mastrangelo, Mark A. Burns, and David T. Burke "Selective hydrophobic and hydrophilic texturing of surfaces using photolithographic photodeposition of polymers", Proc. SPIE 3515, Microfluidic Devices and Systems, (10 September 1998); https://doi.org/10.1117/12.322075

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