10 September 1998 Selective hydrophobic and hydrophilic texturing of surfaces using photolithographic photodeposition of polymers
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Proceedings Volume 3515, Microfluidic Devices and Systems; (1998) https://doi.org/10.1117/12.322075
Event: Micromachining and Microfabrication, 1998, Santa Clara, CA, United States
Abstract
The control and localization of small volumes of aqueous solutions inside miniature reactors is a topic of growing significance. A simple control method relies on patterning regions of different wetability that define and guide the liquid spread within these systems. In this paper photolithographic photodeposition is demonstrated as a technique for texturing patterned surfaces. Hydrophobic surfaces are created by selectively photopolymerizing trifluorochloroethylene gas (C2F3Cl) through a quartz mask. Similarly, hydrophilic surfaces are created via acetylene (C2H2) photopolymerization. These surfaces are demonstrated to provide a simple and effective means of fluidic control and localization.
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Darren K. Jones, Darren K. Jones, Carlos H. Mastrangelo, Carlos H. Mastrangelo, Mark A. Burns, Mark A. Burns, David T. Burke, David T. Burke, } "Selective hydrophobic and hydrophilic texturing of surfaces using photolithographic photodeposition of polymers", Proc. SPIE 3515, Microfluidic Devices and Systems, (10 September 1998); doi: 10.1117/12.322075; https://doi.org/10.1117/12.322075
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