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22 January 1999 End point determination using full-spectrum acquisition and evolving windowed factor analysis
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New research involving determination of endpoint on low open area etches using full spectrum optical emission spectroscopy (OES) will be presented. Traditionally, monochromator based systems have been used to determine endpoint by monitoring one or two strongly emitting wavelengths. For exposed open areas of < 1.0 percent, a more sensitive approach is required for the next generation of chips. Array detectors can provide a wealth of spectral information from a variety of gas phase emitting species, which can potentially each make a contribution to the endpoint signal. Evolving windowed factor analysis (EWFA) processes al of this spectral information into a single eigenvector output representing overall variance, which is used to call endpoint. The eigenvector output, which is influenced by all spectral emissions, is more responsive to the endpoint condition than one or two individual wavelengths. EWFA results form low exposed open area studies will be presented.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wayne Branagh, Jason Rivers, and Robert Fry "End point determination using full-spectrum acquisition and evolving windowed factor analysis", Proc. SPIE 3535, Advanced Sensors and Monitors for Process Industries and the Environment, (22 January 1999);

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