26 February 1999 Semiconductor process tool effluent characterization using extractive FTIR with fast data acquisition
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Proceedings Volume 3537, Electro-Optic, Integrated Optic, and Electronic Technologies for Online Chemical Process Monitoring; (1999); doi: 10.1117/12.341017
Event: Photonics East (ISAM, VVDC, IEMB), 1998, Boston, MA, United States
Abstract
A system has been developed using extractive FTIR techniques to characterize the gaseous emissions from semiconductor wafer process tools. The system provides real-time data collection, processing and display for multiple compounds simultaneously. Tool effluent emission profiles, which track concentrations are produced with time resolutions on the order of seconds. Along with a description of the hardware, sampling and analysis methods, the results of some field testing and system validations are also presented.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Curtis T. Laush, "Semiconductor process tool effluent characterization using extractive FTIR with fast data acquisition", Proc. SPIE 3537, Electro-Optic, Integrated Optic, and Electronic Technologies for Online Chemical Process Monitoring, (26 February 1999); doi: 10.1117/12.341017; https://doi.org/10.1117/12.341017
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