26 February 1999 Semiconductor process tool effluent characterization using extractive FTIR with fast data acquisition
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Abstract
A system has been developed using extractive FTIR techniques to characterize the gaseous emissions from semiconductor wafer process tools. The system provides real-time data collection, processing and display for multiple compounds simultaneously. Tool effluent emission profiles, which track concentrations are produced with time resolutions on the order of seconds. Along with a description of the hardware, sampling and analysis methods, the results of some field testing and system validations are also presented.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Curtis T. Laush, Curtis T. Laush, } "Semiconductor process tool effluent characterization using extractive FTIR with fast data acquisition", Proc. SPIE 3537, Electro-Optic, Integrated Optic, and Electronic Technologies for Online Chemical Process Monitoring, (26 February 1999); doi: 10.1117/12.341017; https://doi.org/10.1117/12.341017
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