18TH ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENT
16-18 September 1998
Redwood City, CA, United States
Photomask Patterning
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 32 (18 December 1998); doi: 10.1117/12.332813
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 45 (18 December 1998); doi: 10.1117/12.332823
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 55 (18 December 1998); doi: 10.1117/12.332834
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 63 (18 December 1998); doi: 10.1117/12.332844
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 74 (18 December 1998); doi: 10.1117/12.332854
Overview Presentation
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 10 (18 December 1998); doi: 10.1117/12.332863
Resist, Materials, and Processes
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 88 (18 December 1998); doi: 10.1117/12.332879
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 98 (18 December 1998); doi: 10.1117/12.332814
Defects, Inspection, and Repair
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 112 (18 December 1998); doi: 10.1117/12.332815
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 121 (18 December 1998); doi: 10.1117/12.332816
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 132 (18 December 1998); doi: 10.1117/12.332817
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 139 (18 December 1998); doi: 10.1117/12.332818
Mask Metrology
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 146 (18 December 1998); doi: 10.1117/12.332819
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 154 (18 December 1998); doi: 10.1117/12.332820
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 159 (18 December 1998); doi: 10.1117/12.332821
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 167 (18 December 1998); doi: 10.1117/12.332822
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 173 (18 December 1998); doi: 10.1117/12.332824
Advanced Mask Technology
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 184 (18 December 1998); doi: 10.1117/12.332826
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 194 (18 December 1998); doi: 10.1117/12.332827
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 206 (18 December 1998); doi: 10.1117/12.332828
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 214 (18 December 1998); doi: 10.1117/12.332829
Resolution Enhancement Techniques
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 222 (18 December 1998); doi: 10.1117/12.332830
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 232 (18 December 1998); doi: 10.1117/12.332831
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 242 (18 December 1998); doi: 10.1117/12.332832
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 253 (18 December 1998); doi: 10.1117/12.332833
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 270 (18 December 1998); doi: 10.1117/12.332835
BACUS '98 Special Focus Program on Mask Technology and the 1998 National Technology Roadmap for Semiconductors
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 280 (18 December 1998); doi: 10.1117/12.332836
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 288 (18 December 1998); doi: 10.1117/12.332837
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 304 (18 December 1998); doi: 10.1117/12.332838
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 313 (18 December 1998); doi: 10.1117/12.332839
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 325 (18 December 1998); doi: 10.1117/12.332840
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 338 (18 December 1998); doi: 10.1117/12.332841
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 340 (18 December 1998); doi: 10.1117/12.332842
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 349 (18 December 1998); doi: 10.1117/12.332843
Poster Session: Resist, Materials, and Processes
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 400 (18 December 1998); doi: 10.1117/12.332845
Poster Session: Resolution Enhancement Techniques (OPC/PSM)
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 558 (18 December 1998); doi: 10.1117/12.332846
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 574 (18 December 1998); doi: 10.1117/12.332847
Poster Session: Defects, Inspection, and Repair
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 440 (18 December 1998); doi: 10.1117/12.332848
Poster Session: Resist, Materials, and Processes
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 409 (18 December 1998); doi: 10.1117/12.332849
Poster Session: Defects, Inspection, and Repair
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 454 (18 December 1998); doi: 10.1117/12.332850
Poster Session: Mask Metrology
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 494 (18 December 1998); doi: 10.1117/12.332851
Poster Session: Resist, Materials, and Processes
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 413 (18 December 1998); doi: 10.1117/12.332852
Poster Session: Mask Metrology
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 498 (18 December 1998); doi: 10.1117/12.332853
Poster Session: Photomask Patterning
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 358 (18 December 1998); doi: 10.1117/12.332855
Poster Session: Resolution Enhancement Techniques (OPC/PSM)
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 585 (18 December 1998); doi: 10.1117/12.332856
Poster Session: Advanced Mask Technology
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 514 (18 December 1998); doi: 10.1117/12.332857
Poster Session: Resolution Enhancement Techniques (OPC/PSM)
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 594 (18 December 1998); doi: 10.1117/12.332858
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 606 (18 December 1998); doi: 10.1117/12.332859
Poster Session: Resist, Materials, and Processes
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 422 (18 December 1998); doi: 10.1117/12.332860
Poster Session: Resolution Enhancement Techniques (OPC/PSM)
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 617 (18 December 1998); doi: 10.1117/12.332861
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 642 (18 December 1998); doi: 10.1117/12.332862
Poster Session: Resist, Materials, and Processes
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 429 (18 December 1998); doi: 10.1117/12.332864
Poster Session: Advanced Mask Technology
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 524 (18 December 1998); doi: 10.1117/12.332865
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 531 (18 December 1998); doi: 10.1117/12.332866
Poster Session: Resolution Enhancement Techniques (OPC/PSM)
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 651 (18 December 1998); doi: 10.1117/12.332867
Poster Session: Mask Metrology
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 505 (18 December 1998); doi: 10.1117/12.332868
Poster Session: Defects, Inspection, and Repair
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 466 (18 December 1998); doi: 10.1117/12.332869
Poster Session: Photomask Patterning
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 361 (18 December 1998); doi: 10.1117/12.332870
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 368 (18 December 1998); doi: 10.1117/12.332871
Poster Session: Defects, Inspection, and Repair
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 477 (18 December 1998); doi: 10.1117/12.332872
Poster Session: Advanced Mask Technology
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 540 (18 December 1998); doi: 10.1117/12.332873
Poster Session: Photomask Patterning
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 383 (18 December 1998); doi: 10.1117/12.332874
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 389 (18 December 1998); doi: 10.1117/12.332875
Poster Session: Resolution Enhancement Techniques (OPC/PSM)
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 661 (18 December 1998); doi: 10.1117/12.332876
Poster Session: Advanced Mask Technology
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 548 (18 December 1998); doi: 10.1117/12.332877
Poster Session: Defects, Inspection, and Repair
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 485 (18 December 1998); doi: 10.1117/12.332878
Keynote Address
Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, pg 2 (18 December 1998); doi: 10.1117/12.332825
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