18 December 1998 Actinic detection of EUVL mask blank defects
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Abstract
We report the design and initial experimental results of an actinic inspection system for extreme ultraviolet lithography mask blank defect detection. Initial bright-field and dark- field results demonstrate sensitivity to submicron size phase defects.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Seongtae Jeong, Seongtae Jeong, Mourad Idir, Mourad Idir, Lewis E. Johnson, Lewis E. Johnson, Yun Lin, Yun Lin, Phillip J. Batson, Phillip J. Batson, Richard Levesque, Richard Levesque, Patrick A. Kearney, Patrick A. Kearney, Pei-yang Yan, Pei-yang Yan, Eric M. Gullikson, Eric M. Gullikson, James H. Underwood, James H. Underwood, Jeffrey Bokor, Jeffrey Bokor, } "Actinic detection of EUVL mask blank defects", Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); doi: 10.1117/12.332865; https://doi.org/10.1117/12.332865
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