18 December 1998 Automated layout and phase assignment techniques for dark-field alternating PSM
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Abstract
We describe new, efficient algorithms for layout modification and phase assignment for dark field alternating-type phase- shifting masks in the single-exposure regime. We make the following contributions. First, we give optimal and fast algorithms to minimize the number of phase conflicts that must be removed to ensure 2-colorability of the conflict graph. These methods can potentially reduce runtime and/or improve solution quality, compared to previous approaches of Moniwa et al. and Ooi et al. Second, we suggest a new iterative 2- coloring and compaction approach that simultaneously optimizes layout and phase assignment. The approach iteratively performs the following steps: (1) compact the layout and find the conflict graph; (2) find the minimum set of edges whose deletion makes the conflict graph bipartite; and (3) add a new compaction constraint for each edge in this minimum set, such that the corresponding pair of features will no longer conflict. Third, we describe additional approaches to co- optimization of layout and phase assignment for alternating PSM. Preliminary computational experience appears promising.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andrew B. Kahng, Andrew B. Kahng, Huijuan Wang, Huijuan Wang, Alexander Zelikovsky, Alexander Zelikovsky, } "Automated layout and phase assignment techniques for dark-field alternating PSM", Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); doi: 10.1117/12.332830; https://doi.org/10.1117/12.332830
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