Detecting CD error or transmission error of photomask patterns

Kyoji Yamashita

doi:10.1117/12.332819

18 December 1998 Detecting CD error or transmission error of photomask patterns

Kyoji Yamashita

Proceedings Volume 3546, 18th Annual BACUS Symposium on Photomask Technology and Management; (1998) https://doi.org/10.1117/12.332819
Event: 18th Annual BACUS Symposium on Photomask Technology and Management, 1998, Redwood City, CA, United States

Abstract

Whereas critical-dimension (CD) error below 35 nm and transmission error below 3.5% are required for 256 M DRAM, a present-day cutting-edge inspection system may fail to detect 150 nm CD error or 6% transmission error. Improvement of defect inspection is, therefore, necessary to raise yields of semiconductor devices. A new inspection algorithm has been developed for CD error and transmission error of photomask patterns by calculating the average transmission error. Experimental results show as small as 4% transmission error or over 25 nm CD error of hole pattern will be detected without any false alarms.

Citation Download Citation

Kyoji Yamashita "Detecting CD error or transmission error of photomask patterns", Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); https://doi.org/10.1117/12.332819

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available