Evaluation of the practical use of GHOST technique for various e-beam resists

Byung-Cheol Cha; Jin-Min Kim; Byung Guk Kim; Seong-Woon Choi; Hee-Sun Yoon; Jung-Min Sohn

doi:10.1117/12.332834

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18 December 1998 Evaluation of the practical use of GHOST technique for various e-beam resists

Byung-Cheol Cha, Jin-Min Kim, Byung Guk Kim, Seong-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

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Proceedings Volume 3546, 18th Annual BACUS Symposium on Photomask Technology and Management; (1998) https://doi.org/10.1117/12.332834
Event: 18th Annual BACUS Symposium on Photomask Technology and Management, 1998, Redwood City, CA, United States

Abstract

In this paper we present results of the application of the GHOST technique to the practical use with 10 keV system. Three commercial e-beam resists which include ZEP7000, PBS, and EBR9 HS31 are selected for comparisons. The background dose equalization by the GHOST technique was found to be effective in reducing the proximity effect. It is generally assumed that exposure contrast degradation due to secondary exposure with largely defocused beam for the GHOST technique, especially at boundary between pattern pixel and nonpattern pixel, leads to poor CD uniformity. Thus, we examined CD uniformity variations as a function of with and without the GHOST technique for three e-beam resists .And we also reported the comparison of proximity effect correction quality for three resists by looking at CD linearity in order to investigate relationship between proximity effect and resist contrast.

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Byung-Cheol Cha, Jin-Min Kim, Byung Guk Kim, Seong-Woon Choi, Hee-Sun Yoon, and Jung-Min Sohn "Evaluation of the practical use of GHOST technique for various e-beam resists", Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); https://doi.org/10.1117/12.332834

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